Citation: Nianhua Luo, Jiayi Jiang, Muhammad Suleman, Zhaowen Liu, Shuping Huang, Wei Xiao, Jie Wu, Jiapian Huang. Advances in radical Smiles rearrangement[J]. Chinese Chemical Letters, ;2026, 37(2): 111556. doi: 10.1016/j.cclet.2025.111556 shu

Advances in radical Smiles rearrangement

    * Corresponding authors.
    E-mail addresses: jie_wu@fudan.edu.cn (J. Wu), huangjp@tzc.edu.cn (J. Huang).
    1 These authors contributed equally to this work.
  • Received Date: 14 May 2025
    Revised Date: 22 June 2025
    Accepted Date: 7 July 2025
    Available Online: 8 July 2025

Figures(9)

Metrics
  • PDF Downloads(0)
  • Abstract views(10)
  • HTML views(1)

通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索
Address:Zhongguancun North First Street 2,100190 Beijing, PR China Tel: +86-010-82449177-888
Powered By info@rhhz.net

/

DownLoad:  Full-Size Img  PowerPoint
Return