Citation: Jie Wang, Jijie Zhang, Defang Ma, Zhenxiang Sun, Yan Wang, Qinyan Yue, Yanwei Li, Yue Gao, Baoyu Gao, Xing Xu. Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H₂O₂ system: Competitive interactions and wavelength dependence[J]. Chinese Chemical Letters, ;2026, 37(2): 111209. doi: 10.1016/j.cclet.2025.111209 shu

Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H₂O₂ system: Competitive interactions and wavelength dependence

Jie Wang ^a ,
Jijie Zhang ^a ,
Defang Ma ^a ,
Zhenxiang Sun ^a ,
Yan Wang ^a ,
Qinyan Yue ^a ,
Yanwei Li ^b ,
Yue Gao ^{a, *,} ,
Baoyu Gao ^{a, *,} ,
Xing Xu ^a

a.
Key Laboratory of Water Pollution Control and Recycling (Shandong), School of Environmental Science and Engineering, Shandong University, Qingdao 266237, China
b.
Environment Research Institute, Shandong University, Qingdao 266237, China

ygao@sdu.edu.cn

baoyugao_sdu@aliyun.com

Received Date: 11 December 2024
Revised Date: 8 February 2025
Accepted Date: 14 April 2025
Available Online: 15 April 2025

Figures(5)

The coexistence of emerging containments, such as antibiotic resistant bacteria (ARB), antibiotic-resistant genes (ARGs) and antibiotics, potentially influence elimination efficiencies in UV light-emitting diode (UV-LED) alone and UV-LED/H₂O₂ system as their complex interactions. Tetracycline (TC) degradation efficiency (k_F) correlated closely with its UV molar absorbance (R² = 0.831) in UV-LED alone system and with ^•OH yield (R² = 0.999) in UV-LED/H₂O₂ system across studied wavelengths (265, 280 and 310 nm). The k_F values for intracellular DNA (i-ARGs) also exhibited a high correlation with UV-LED wavelengths in both systems (R² = 0.997–0.999). The coexistence of TC and ARB/ARGs resulted in a mutual inhibition of their degradation efficiencies due to competition for photons and ^•OH, along with the consequent reduction in intracellular ROS within ARB, with their degradation efficiencies exhibiting marked dependence on wavelength in both systems. Notably, the UV-LED/H₂O₂ system at 265 nm effectively achieved the simultaneous removal of TC, ARB and ARGs with minimal energy consumption, and successfully fragmented ARGs. The degradation pathway of TC was analyzed, and the biotoxicity of its degradation intermediates demonstrated the environmental friendliness and safety of UV-LED/H₂O₂ technology. This study elucidated the competitive interactions between antibiotics and ARB/ARGs within UV-LED/H₂O₂ system, providing a promising approach for their simultaneous removal while ensuring energy efficiency.
- UV-LED/H₂O₂,
- ARB/ARGs,
- Wavelength dependence,
- Competition,
- Simultaneous removal
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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H2O2 system: Competitive interactions and wavelength dependence

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通讯作者: 陈斌, bchen63@163.com

Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H₂O₂ system: Competitive interactions and wavelength dependence