Selective monotetrahydropyranylation of symmetrical diols using P2O5/SiO2 under solvent-free conditions and their depyranylation

Hossein Eshghi Mohammad Rahimizadeh Sattar Saberi

引用本文: Hossein Eshghi,  Mohammad Rahimizadeh,  Sattar Saberi. Selective monotetrahydropyranylation of symmetrical diols using P2O5/SiO2 under solvent-free conditions and their depyranylation[J]. Chinese Chemical Letters, 2008, 19(9): 1063-1067. doi: 10.1016/j.cclet.2008.06.031 shu
Citation:  Hossein Eshghi,  Mohammad Rahimizadeh,  Sattar Saberi. Selective monotetrahydropyranylation of symmetrical diols using P2O5/SiO2 under solvent-free conditions and their depyranylation[J]. Chinese Chemical Letters, 2008, 19(9): 1063-1067. doi: 10.1016/j.cclet.2008.06.031 shu

Selective monotetrahydropyranylation of symmetrical diols using P2O5/SiO2 under solvent-free conditions and their depyranylation

摘要: Selective protection of one of the hydroxyl group in 1, n-symmetrical diols is achieved by P2O5/SiO2-catalyzed reaction of the diol with dihydropyran under solvent-free conditions at room temperature. This selective protection is simple and it occurred under economically cheap conditions in high yield. The deprotected diol is simply obtained by refluxing of this compound in methanol using the same catalyst without any byproduct formation or additional purifications.

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  • 收稿日期:  2008-02-26
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