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Citation: Jiang Guifeng, Yu Zuzhan. Laser-Induced Selective Deposition of Copper on p-Silicon Wafers[J]. Chinese Journal of Applied Chemistry, ;1996, 13(2): 18-21. shu

Laser-Induced Selective Deposition of Copper on p-Silicon Wafers

Jiang Guifeng ,
Yu Zuzhan

1.
Department of Chemistry, Fudan University, Shanghai 200433

Received Date: 28 June 1995
Available Online: 30 October 1995
Fund Project:

A process is described to selectively deposit thin copper films from electroless copper plating solutions on p-silicon wafers. The p-silicon was locally irradiated using a 5 W CW Ar⁺ laser. At the irradiated area,the copper film was formed.In this process.three kinds of thin copper films were obtained from the solutions containing different reductants. Composition and properties of the deposits were investigated using AES, SEM and RBS techniques.
- electroless plating,
- laser-induced deposition
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Laser-Induced Selective Deposition of Copper on p-Silicon Wafers

南开大学师唯/华北电力大学（保定）刘景维：二维配位聚合物中有序的亲锂冠醚位点用于无枝晶锂沉积

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通讯作者: 陈斌, bchen63@163.com