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Citation: Li Wenfan, Liu Xiuying. THE EFFECT OF CHROMIUM DEPOSITION RATE ON THE BEHAVIOUR OF Cr-MIS SOLAR CELL[J]. Chinese Journal of Applied Chemistry, ;1986, 3(2): 48-52. shu

THE EFFECT OF CHROMIUM DEPOSITION RATE ON THE BEHAVIOUR OF Cr-MIS SOLAR CELL

Li Wenfan ,
Liu Xiuying

1.
Changchun Institute of Applied Chemistry, Academia Sinica

Received Date: 2 February 1985
Available Online: 12 June 1985

It was shown in this paper that the work function of the rapidly deposited Cr layer was smaller than that of slowly deposited one with the average value of 3.99eV and an increased value of V_oc up to 0.51-0.56V.The sheet resistance of Cr can then be decreased.Therefore,the Cu layer as well as the outer layer of Cr usually deposited for decreasing the sheet resistance of Cr and for preventing Cu from oxidation,respectively, can be saved.The conversion effecioncy of Cr-MIS solar cell is of 12%,based on the active area of 1.3cm² at AM_1.5 (100mW/cm²).
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