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Citation: Liu Bing, Gong Zhenglie, Yao Suwei, Guo Hetong, Yuan Huatang, Zhang Yunshi. Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon[J]. Chinese Journal of Applied Chemistry, ;1999, 16(1): 80-82. shu

Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon

1.
a Institute of New Energy Material Chemistry, Nankai University, Tianjin 300071;
2.
b Zhengzhou Coal Management College, Zhengzhou;
3.
c Institute of Chemical Engineering, Tianjin University, Tianjin

Received Date: 15 May 1998
Available Online: 22 September 1998
Fund Project: 国家自然科学基金资助项目(69478012) (69478012)

Laser induced electroless deposition of nickel on the semiconductor silicon after Pd impregnation has been carried out by using YAG laser and investigated by XPS combined with Ar⁺ sputtering technique. The results indicated the existence of interdiffusion between Ni, Pd and Si at room temperature and formation of different silicide compounds.
- laser induced electroless deposition,
- nickel,
- semiconductor silicon
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