Citation:
HE Han-Wei, HU Yue-Hua, ZHOU Ke-Chao, XU Jin. Recent Advancement of Chemical-Mechanical Polishing Technology of Metal[J]. Chinese Journal of Applied Chemistry,
;2003, 20(5): 415-419.
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Recent researches on chemical-mechanical polishing (CMP) technology are reviewed,which include the advancements of CMP experimental methods,the characterization of the polishing effectiveness,the developments of CMP equipments and expendables.The troubles occurred in CMP technology are analyzed and some suggestions are proposed.It is concluded that establishment of a quantitative CMP rate equation is one of the key points in carring out the in-situ terminal checkout.
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Keywords:
- metal,
- chemical-mechanical polishing,
- review
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