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Citation: HE Han-Wei, HU Yue-Hua, ZHOU Ke-Chao, XU Jin. Recent Advancement of Chemical-Mechanical Polishing Technology of Metal[J]. Chinese Journal of Applied Chemistry, ;2003, 20(5): 415-419. shu

Recent Advancement of Chemical-Mechanical Polishing Technology of Metal

HE Han-Wei ^a,, ,
HU Yue-Hua ^b ,
ZHOU Ke-Chao ^a ,
XU Jin ^b

1.
a State Key Laboratory of Powder Metallutgy, Central South University, Changsha 410083;
2.
b School of Resources Processing and Bioengineering, Central South University, Changsha

Corresponding author: HE Han-Wei,
Received Date: 29 August 2002
Available Online: 20 January 2003
Fund Project: 国家杰出青年科学基金资助(59925412) (59925412)

Recent researches on chemical-mechanical polishing (CMP) technology are reviewed,which include the advancements of CMP experimental methods,the characterization of the polishing effectiveness,the developments of CMP equipments and expendables.The troubles occurred in CMP technology are analyzed and some suggestions are proposed.It is concluded that establishment of a quantitative CMP rate equation is one of the key points in carring out the in-situ terminal checkout.
- metal,
- chemical-mechanical polishing,
- review
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