Citation: Dong Fan. High-Performance Single-Atom Implanted Metal-Organic Framework/MnO₂ for NO_x Oxidation in Plasma[J]. Acta Physico-Chimica Sinica, ;2021, 37(8): 201007. doi: 10.3866/PKU.WHXB202010074 shu

High-Performance Single-Atom Implanted Metal-Organic Framework/MnO₂ for NO_x Oxidation in Plasma

Dong Fan

Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu 611731, China

Author Bio: Fan Dong, Email:
Available Online: 4 November 2020

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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

High-Performance Single-Atom Implanted Metal-Organic Framework/MnO2 for NOx Oxidation in Plasma

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通讯作者: 陈斌, bchen63@163.com

High-Performance Single-Atom Implanted Metal-Organic Framework/MnO₂ for NO_x Oxidation in Plasma