Citation:
Yang Yong-Lai, Xu Heng-Yong, Li Wen-Zhao. Promotion Effects of CeO2 and Pd on Ni/γ-Al2O3 Catalyst[J]. Acta Physico-Chimica Sinica,
;2002, 18(04): 321-325.
doi:
10.3866/PKU.WHXB20020407
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The influence of the addition of ntype semiconductor oxide CeO2 and noble metal Pd to Ni/γAl2O3 catalyst on carbon deposition by CH4 and carbon elimination by CO2 was studied by using a pulse microreaction as well as BET, TPR, CO2TPSR and hydrogen chemisorption techniques. It was found that, the addition of ntype semiconductor CeO2 to Ni/γAl2O3 catalyst could decrease carbon deposition activity of CH4 and increase carbon elimination ability of CO2; the addition of noble metal Pd could further alter the interaction between support Al2O3, promoter CeO2 and active phase Ni, as a result, the performance of resistance to carbon deposition of Ni/γAl2O3 catalyst was improved. At the same time, a new explanation for the above promoting effect was put forward by the models of carbon deposition by CH4 and carbon elimination by CO2 on the NiCePd/γAl2O3 catalyst.
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