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Citation: Wang Yu, Liu Guan-Kun, He Feng-Rong, Tong Ye-Xiang. Electrodeposition of Ho-Ni Alloy from Dimethyformamide Bath[J]. Acta Physico-Chimica Sinica, ;2001, 17(03): 206-209. doi: 10.3866/PKU.WHXB20010304 shu

Electrodeposition of Ho-Ni Alloy from Dimethyformamide Bath

1.
Faculty of Chemistry and Chemical Engineering, Zhongshan University, Guangzhou 　510275, China

Received Date: 19 July 2000
Available Online: 15 March 2001

Cyclic voltammetry was used to study the electroreduction of Ho(III) i n Ho(NO3)3LiClO4DMF. The results showed that traces of water in this system blocked the electroreduct ion of Ho(III) by forming LiOH and Ho(OH)3 films on the electrode surface. Cod eposition of Ho and Ni was studied in dimethylformamide by cyclic voltammetry an d potentiostatic deposition at room temperature. Potentiostatic deposition was u sed to prepare HoNi alloys. EDAX, SEM and XRD were used to analyze the films. The results indicated that black, adhesive and amorphous HoNi alloy films on C u were produced where the content of Ho could be as high as 72.7 ％.
- Rare earths;Potentiostatic deposition;Dimethylformamide;Ho-Ni alloy
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