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Citation: CHEN Yunhua, GONG Chuqing, ZHANG Haibo, DENG Lizhi, XIA Chunlan. Improvement of Gas Flow Control Device for Saturated Vapor Pressure Measurements[J]. University Chemistry, ;2018, 33(12): 51-55. doi: 10.3866/PKU.DXHX201804005 shu

Improvement of Gas Flow Control Device for Saturated Vapor Pressure Measurements

National Demonstration Center for Experimental Chemistry Education, College of Chemistry and Molecular Sciences, Wuhan University, Wuhan 430072, P. R. China

Received Date: 4 April 2018

In the static method of saturated vapor pressure measurements, the key operation is to adjust the pressure of the system. Because of the invisibility of the gas, it is difficult to control the air flow, which often results in air pouring into the system due to excessive air flow in the constant pressure adjustment process. By designing a mini gas flow control device, the control operation is visualized; thus, problems associated with controlling the air flow can be avoided. Furthermore, frequent adjustment of the air flow becomes unnecessary, greatly reducing the lab hour.
- Physical chemistry experiment,
- Saturated vapor pressure,
- Isopiestic adjustment
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