Citation: ZHANG Wei-Jie, CHEN Jin-Ping, YU Tian-Jun, ZENG Yi, GUO Xu-Dong, WANG Shuang-Qing, YANG Guo-Qiang, LI Yi. Removal and Quantitative Analysis of Metal Ions in Photoresist[J]. Chinese Journal of Analytical Chemistry, ;2021, 49(10): 1750-1757. doi: 10.19756/j.issn.0253-3820.211248 shu

Removal and Quantitative Analysis of Metal Ions in Photoresist

ZHANG Wei-Jie ^1,3 ,
CHEN Jin-Ping ^1,, ,
YU Tian-Jun ¹ ,
ZENG Yi ^1,3 ,
GUO Xu-Dong ² ,
WANG Shuang-Qing ² ,
YANG Guo-Qiang ^2,3,, ,
LI Yi ^1,3,,

1.
CAS Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China;
2.
CAS Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China;
3.
University of Chinese Academy of Sciences, Beijing 100039, China

Corresponding author: CHEN Jin-Ping, YANG Guo-Qiang, LI Yi,
Received Date: 23 March 2021
Revised Date: 11 June 2021

Fund Project: Supported by the National Natural Science Foundation of China (Nos.22090012, U20A20144) and the Chinese Academy of Sciences (No.YZQT020).

Thiol resin was used as an adsorbent to remove metal ions in organic photoresists. The thermodynamics and kinetics of the adsorption of Pd in photoresists were investigated extensively by inductively coupled plasma-mass spectrometry (ICP-MS). The adsorption data of Pd ion under different temperatures followed pseudo-second-order kinetic model, indicating that the adsorption process was controlled by chemical interactions of Pd and thiol groups. The results of isothermal adsorption were fitted well with Langmuir isothermal adsorption model, indicating that Pd in photoresist tended to adsorb monolayer on the surface of thiol resin. With the temperature increased, the maximum adsorption capacity of thiol resin for Pd increased from 12.68 mg/g to 17.49 mg/g, suggesting that appropriately increasing the adsorption temperature was helpful to improve the adsorption efficiency. The comprehensive purification results showed that thiol resin could be considered as a promising adsorbent for removal of Li, Na, Mg, Al, K, Ca, Cr, Mn, Fe, Ni, Cu, Zn, Pd and Sn ions in the photoresist. Most of the metal ions could be removed, with residual concentration down to 1.0 μg/L level. Compared with the Pall purification system, thiol resin was more effective for Pd purification, decreasing the content of Pd from 5.9 mg/L to 0.4 μg/L. However, for abundant metal ions such as Na and Ca with reducing limitation to 11.8 μg/L and 13.0 μg/L, respectively, the purification needs to be further optimized.
- Photoresist,
- Removal of metal ions,
- Thiol resin,
- Adsorption kinetics,
- Isothermal adsorption
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