Citation: CHEN Jin-Ping,  HAO Qing-Shan,  WANG Shuang-Qing,  YANG Shu-Min,  ZHAO Jun,  WU Yan-Qing,  ZENG Yi,  YU Tian-Jun,  YANG Guo-Qiang,  LI Yi. Qualitative and Quantitative Measurement of Outgassing of Molecular Glass Photoresists under Extreme Ultraviolet Lithography[J]. Chinese Journal of Analytical Chemistry, ;2020, 48(12): 1658-1665. doi: 10.19756/j.issn.0253-3820.201366 shu

Qualitative and Quantitative Measurement of Outgassing of Molecular Glass Photoresists under Extreme Ultraviolet Lithography

  • Received Date: 24 June 2020
    Revised Date: 27 October 2020

    Fund Project: This work was supported by the National Science and Technology Major Project of the Ministry of Science and Technology of the People's Republic of China (Nos. 2018ZX02102005, 2011ZX02701).

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    沈阳化工大学材料科学与工程学院 沈阳 110142

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