Citation: LI Gang, LI Da-Wei, ZHAO Qing-Hua, JIAN Ao-Qun, WANG Kai-Ying, HU Jie, SANG Sheng-Bo, CHENG Zai-Jun, . Fabrication of 3D SU-8 Photoresist Microarrays via Inclined Uitraviolet Lithography[J]. Chinese Journal of Analytical Chemistry, ;2016, 44(4): 660-664. doi: 10.11895/j.issn.0253-3820.150967 shu

Fabrication of 3D SU-8 Photoresist Microarrays via Inclined Uitraviolet Lithography

LI Gang ¹ ,
LI Da-Wei ¹ ,
ZHAO Qing-Hua ¹ ,
JIAN Ao-Qun ¹ ,
WANG Kai-Ying ¹ ,
HU Jie ¹ ,
SANG Sheng-Bo ^1,, ,
CHENG Zai-Jun ² ,
³

1.
¹ MicroNano System Research Center, College of Information Engineering & Key Lab of Advanced Transducers and Intelligent Control System(Ministry of Education), Taiyuan University of Technology, Taiyuan 030024, China;
2.
² School of Opto-electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China;
3.
³ GMCC Electronic Technology Wuxi Co., Ltd., Wuxi 214000, China

Corresponding author: SANG Sheng-Bo,
Received Date: 7 December 2015
Available Online: 5 March 2016
Fund Project: 本文系国家自然科学基金(Nos.61504113,51205275) (Nos.61504113,51205275)人社部留学基金(No.[2014]240)山西省归国留学基金(2013-035) (No.[2014]240)山西省归国留学基金(2013-035)山西省人社厅留学人员择优资助(No.[2013]251)山西省科技研究基金(Nos.20141001021-2,2014011019-1) (No.[2013]251)山西省科技研究基金(Nos.20141001021-2,2014011019-1)国家863计划(No.2013AA041100) (No.2013AA041100)山西省科技重大专项(No.20121101004) (No.20121101004)山西省高等特色学科建设项目([2012]45)资助 ([2012]45)

To increase the specific surface area of three-dimensional(3D) microarrays, we proposed a novel method using the inclined UV lithography of the negative thick SU-8 photoresist instead of the traditional lithography. Firstly, we studied the effects of the array arrangement on the surface area of the SU-8 photoresist-based microarrays with MATLAB simulation, and determined the best parameters of the width of single micro-column and the space of the microarrays. During the fabrication processes, photoresist spinning was firstly performed twice to deposit a thick SU-8 photoresist layer on 2-inch silicon substrate, while the rotational speed and time were respectively set to 1500 r/min and 35 s. Then, the samples were respectively placed on a baking plate for 20 min at 65℃ and 70 min at 95℃ for pre-baking. The next step was the inclined UV lithography from both sides, in which the width of micro pillars was 20μm, the space between the pillars was 30μm and the lithography angle was 20°. Finally, we successfully fabricated the stable "X" type microarray with high specific surface after the high-low temperature post exposure baking and 30 min developing.
- Three-dimensional microarrays,
- Inclined ultraviolet lithography SU-8 photoresist,
- Specific surface area,
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