Citation: Guang-Cheng Huang, Sheng-Xiang Ji. Effect of Halogen Chain End Fidelity on the Synthesis of Poly(methyl methacrylate-b-styrene) by ATRP[J]. Chinese Journal of Polymer Science, ;2018, 36(11): 1217-1224. doi: 10.1007/s10118-018-2139-2 shu

Effect of Halogen Chain End Fidelity on the Synthesis of Poly(methyl methacrylate-b-styrene) by ATRP

Guang-Cheng Huang ^1,2 ,
Sheng-Xiang Ji ^1,,

a.
Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
b.
University of Chinese Academy of Sciences, Beijing 100049, China

Corresponding author: Sheng-Xiang Ji, sji@ciac.ac.cn
Received Date: 2 March 2018
Revised Date: 27 March 2018
Accepted Date: 30 March 2018
Available Online: 24 April 2018

Poly(methyl methacrylate-b-styrene) (PMMA-b-PS) block copolymers are synthesized by two consecutive ATRPs and fractionated into four fractions. The halogen chain end fidelity (CEF) in PMMA-b-PS is quantified based on the analysis of each fraction. Compared to ethyl 2-phenyl-2-bromoacetate/CuBr/2,2′-bipyridine (EPBA/CuBr/bpy) and CuBr/N,N,N′,N″,N″-pentamethyldiethylene-triamine (CuBr/PMDETA) catalysts, PMMA-b-PS synthesized using p-toluenesulfonyl chloride/CuCl/bpy (TsCl/CuCl/bpy) and CuCl/PMDETA catalysts has a higher halogen CEF and a better control on molecular weight.
- Atom transfer radical polymerization,
- Chain end fidelity,
- Block copolymer
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