ITO导电玻璃表面直接电沉积Au的机理

引用本文: 汤儆, 田晓春, 周富庆, 刘跃强, 林建航. ITO导电玻璃表面直接电沉积Au的机理[J]. 物理化学学报, 2011, 27(03): 641-646. doi: 10.3866/PKU.WHXB20110322 shu

Citation: TANG Jing, TIAN Xiao-Chun, ZHOU Fu-Qing, LIU Yue-Qiang, LIN Jian-Hang. Mechanism of Au Electrodeposition onto Indium Tin Oxide[J]. Acta Physico-Chimica Sinica, 2011, 27(03): 641-646. doi: 10.3866/PKU.WHXB20110322 shu

ITO导电玻璃表面直接电沉积Au的机理

基金项目:
国家自然科学基金(20873112) (20873112)

国家光电子晶体材料工程技术研究中心开放课题(2005DC105003)资助项目 (2005DC105003)

摘要:

用循环伏安和电位阶跃法研究Au在氧化铟锡(ITO)透明导电膜玻璃表面的电沉积过程的初期阶段. 发现在ITO表面Au的电沉积经历成核过程以及受[AuCl₄]^-扩散控制的晶核生长过程. 通过改变扫描速率分析循环伏安曲线的变化, 当扫描速率较快时, 发现Au在ITO表面的沉积过程经历[AuCl₄]^-→[AuCl₂]^-→Au两步进行; 当扫描速率较慢时, 受歧化反应作用影响而只表现为一步沉积[AuCl₄]^-→Au. 通过电位阶跃实验, 验证了Au的两步沉积过程, 并求得[AuCl₄]^-的扩散系数为1.3×10^-5 cm²·s^-1. 将成核曲线与理论曲线对照, 得出Au在ITO表面的沉积符合瞬时成核理论. 通过场发射扫描电镜(FE-SEM)对Au核形貌进行分析, 根据扫描电镜图可以得到阶跃时间和阶跃电位对电沉积Au的形貌的影响.

关键词:

English

Mechanism of Au Electrodeposition onto Indium Tin Oxide

1.
1. Key Laboratory of Analysis and Detection Technology for Food Safety, Ministry of Education, College of Chemistry and Chemical Engineering, Fuzhou University, Fuzhou 350108, P. R. China;
2. Instrumental Measurement and Analysis Center, Fuzhou University, Fuzhou 350002, P. R. China
Received Date: 21 October 2010
Available Online: 03 March 2011
Fund Project:
国家自然科学基金(20873112)

国家光电子晶体材料工程技术研究中心开放课题(2005DC105003)资助项目

Abstract:

Cyclic voltammetric and chronoamperometric methods were used to study the initial stage of Au electrodeposition on an indium tin oxide (ITO) surface. The nucleation process was controlled by the diffusion of [AuCl₄]^-. The cyclic voltammetry curves showed that the electrochemical reduction included two steps which were [AuCl₄]^-→ [AuCl₂]^-, and [AuCl₂]^- → Au. Only one reduction peak was observed when the scan rate was comparatively slow and this peak separated into two peaks when the scan rate was increased. This phenomenon resulted from the disproportionation of [AuCl₂]^- during the electrodeposition process. Chronoamperometry also proved the two step reaction mechanism and the diffusion coefficient of [AuCl₄]^- was calculated to be 1.3×10^-5 cm²·s^-1. From the theoretical nucleation curves, an instantaneous three-dimensional nucleation mechanism was proposed for the nucleation of ld on ITO. Au electrodeposits were observed by field emission scanning electron microscopy (FE-SEM). SEM images of the electrodeposits showed that the morphology of the ld deposits was affected by the electrochemical deposition potential and time.

Key words:

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沈阳化工大学材料科学与工程学院沈阳 110142

ITO导电玻璃表面直接电沉积Au的机理

English

Mechanism of Au Electrodeposition onto Indium Tin Oxide

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通讯作者: 陈斌, bchen63@163.com

中国化学会秘书处

ITO导电玻璃表面直接电沉积Au的机理

English

Mechanism of Au Electrodeposition onto Indium Tin Oxide

CCS Chemistry：嵌段共聚物自组装成 “三明治”二维有机材料，实现纳米级压力传感功能

CCS Chemistry：颜徐州、鲍哲南： 你的皮肤可能是一片SPMs

CCS Chemistry：工作高效不疲劳，只须让催化剂动起来

CCS Chemistry：静电组装导向聚合- 聚电解质纳米凝胶量化制备新策略

CCS Chemistry：金黄色葡萄球菌醛基脱氢酶是如何识别特异性底物的？

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