引用本文:
吕红辉, 文子, 钱新明, 汤心颐, 白玉白. α-Fe2O3纳米晶薄膜厚度对光电流的影响[J]. 应用化学,
2001, 18(10): 777-780.
Citation: LÜ Hong-Hui, WEN Zi, QIAN Xin-Ming, TANG Xin-Yi, BAI Yu-Bai. The Effect of the Thickness of α-Fe2O3 Nanocrystalline Thin Film on the Photocurrent Response[J]. Chinese Journal of Applied Chemistry, 2001, 18(10): 777-780.
Citation: LÜ Hong-Hui, WEN Zi, QIAN Xin-Ming, TANG Xin-Yi, BAI Yu-Bai. The Effect of the Thickness of α-Fe2O3 Nanocrystalline Thin Film on the Photocurrent Response[J]. Chinese Journal of Applied Chemistry, 2001, 18(10): 777-780.
α-Fe2O3纳米晶薄膜厚度对光电流的影响
English
The Effect of the Thickness of α-Fe2O3 Nanocrystalline Thin Film on the Photocurrent Response
Abstract:
The photoelectrochemistry of α-Fe2O3 nanocrystalline thin films with different thickness in KCl solution was studied. It is found that the photocurrent response was decreased with the film thinkness. The decrease of photocurrent responses of thicker films is explained in terms of the electric resistance effect and recombination effect. For thinner α-Fe2O3 film (50 μm) no difference was found for the photocurrent response under frontwall (FW) and backwall (BW) illuminations, while for thicker α-Fe2O3 film (100 μm) the photocurrent response was larger under BW illumination than that under FW illumination.
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Key words:
- α-Fe2O3
- / nanocrystalline thin film
- / photoelectrochemistry
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