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Citation: Hou Haoqing, Li Yuesheng, Ding Mengxian. A Novel Ion-type Photosensitive Polyimide[J]. Chinese Journal of Applied Chemistry, ;1998, 15(2): 103-105. shu

A Novel Ion-type Photosensitive Polyimide

Polymer Chemistry Laboratory, Chinese Academy of Sciences and China Petro-Chemical Corporation, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022

Received Date: 17 July 1997
Revised Date: 18 December 1997

A novel ion-type photosensitive polyimide(PSPI) with thiophen acrylic acid as photosensitizer was prepared. It has a sensitivity of 2500 J/m² and resolution of 1~2 μm under irradiation with Hg lamp of 365 nm wavelength. The catalytic influence of tertiary amine on the imidization of poly(amic acid) during PSPI preparation has been discussed as well.
- photosensitive polyimide,
- preparation,
- photolithographic layer
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