引用本文:
侯豪情, 李悦生, 丁孟贤. 新的离子型光敏聚酰亚胺[J]. 应用化学,
1998, 15(2): 103-105.
Citation: Hou Haoqing, Li Yuesheng, Ding Mengxian. A Novel Ion-type Photosensitive Polyimide[J]. Chinese Journal of Applied Chemistry, 1998, 15(2): 103-105.
Citation: Hou Haoqing, Li Yuesheng, Ding Mengxian. A Novel Ion-type Photosensitive Polyimide[J]. Chinese Journal of Applied Chemistry, 1998, 15(2): 103-105.
新的离子型光敏聚酰亚胺
English
A Novel Ion-type Photosensitive Polyimide
Abstract:
A novel ion-type photosensitive polyimide(PSPI) with thiophen acrylic acid as photosensitizer was prepared. It has a sensitivity of 2500 J/m2 and resolution of 1~2 μm under irradiation with Hg lamp of 365 nm wavelength. The catalytic influence of tertiary amine on the imidization of poly(amic acid) during PSPI preparation has been discussed as well.
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Key words:
- photosensitive polyimide
- / preparation
- / photolithographic layer
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