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Citation:
Jiang Guifeng, Yu Zuzhan. Laser-Induced Selective Deposition of Copper on p-Silicon Wafers[J]. Chinese Journal of Applied Chemistry,
;1996, 13(2): 18-21.
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A process is described to selectively deposit thin copper films from electroless copper plating solutions on p-silicon wafers. The p-silicon was locally irradiated using a 5 W CW Ar+ laser. At the irradiated area,the copper film was formed.In this process.three kinds of thin copper films were obtained from the solutions containing different reductants. Composition and properties of the deposits were investigated using AES, SEM and RBS techniques.
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Keywords:
- electroless plating,
- laser-induced deposition
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