Citation: HUANG Ya-Yu,  FANG Qiu-Yan,  ZHOU Jian-Zhang,  ZHAN Dong-Ping,  SHI Kang,  TIAN Zhong-Qun. Deposition and Inhibition of Cu on TiO2 Nanotube Photoelectrode in Photoinduced Confined Etching System[J]. Acta Physico-Chimica Sinica, ;2017, 33(10): 2042-2051. doi: 10.3866/PKU.WHXB201705125 shu

Deposition and Inhibition of Cu on TiO2 Nanotube Photoelectrode in Photoinduced Confined Etching System

  • Received Date: 13 April 2017
    Revised Date: 2 May 2017

    Fund Project: The project was supported by the National Natural Science Foundation of China (91023043, 21021002, 91023006).

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    沈阳化工大学材料科学与工程学院 沈阳 110142

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