UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

Citation: Lin Qi, Yan-fen Ding, Quan-xiao Dong, Bin Wen, Peng Liu, Feng Wang, Shi-min Zhang, Ming-shu Yang. UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods[J]. Chinese Journal of Polymer Science, 2014, 32(7): 834-843. doi: 10.1007/s10118-014-1472-3 shu

UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

1.
Beijing National Laboratory for Molecular Science, Key Laboratory of Engineering Plastics, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
2.
1. Beijing National Laboratory for Molecular Science, Key Laboratory of Engineering Plastics, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
3.
2. Beijing Engineering Research Center of Architectural Functional Macromolecular Materials, Beijing Building Construction Research Institute, Co., Ltd., Beijing 100039, China
4.

通讯作者: Ming-shu Yang,

基金项目:
This work was financially supported by the National Natural Science Foundation of China (No. 51133009), the National Basic Research Program of China (No. 2012CB720304) and the Strategic Priority Research Program of the Chinese Academy of Sciences (No. XDA09030200).

摘要: Surface modified rutile-type titanium dioxide (CST) nanorods were used as a UV absorber in polypropylene (PP) thick bars in combination with the hindered amine light stabilizer (HALS) Chimassorb 944 (C944). For all of the tested samples, the photodegradation was mainly limited in the region near the exposed surface, as proved by the carbonyl index and molecular weight. Compared with the typical HALS photostabilization system containing organic hindered phenol UV absorber Tinuvin 328 (T328), the thickness of photodegradation region for PP/C944/CST was only a quarter to that for PP/C944 and PP/C944/T328, while the rates of reduction in molecular weight and increase in carbonyl index were much lower. Optical microscopic observation showed that the evolution of surface micro-cracks in PP/C944/CST was quite different from that in the other samples, while scanning electronic micrographs revealed that the depth of the micro-cracks in PP/C944/CST was much shorter than that in the others. It is therefore concluded that the protection of CST on PP thick bars is mainly attributed to the outstanding UV-shielding and cracks-blocking abilities.

关键词:

English

UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

1.
Beijing National Laboratory for Molecular Science, Key Laboratory of Engineering Plastics, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
2.
1. Beijing National Laboratory for Molecular Science, Key Laboratory of Engineering Plastics, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
3.
2. Beijing Engineering Research Center of Architectural Functional Macromolecular Materials, Beijing Building Construction Research Institute, Co., Ltd., Beijing 100039, China
4.

Corresponding author: Ming-shu Yang,

Received Date: 31 March 2014
Revised Date: 21 April 2014
Available Online: 05 July 2014
Fund Project:
This work was financially supported by the National Natural Science Foundation of China (No. 51133009), the National Basic Research Program of China (No. 2012CB720304) and the Strategic Priority Research Program of the Chinese Academy of Sciences (No. XDA09030200).

Abstract: Surface modified rutile-type titanium dioxide (CST) nanorods were used as a UV absorber in polypropylene (PP) thick bars in combination with the hindered amine light stabilizer (HALS) Chimassorb 944 (C944). For all of the tested samples, the photodegradation was mainly limited in the region near the exposed surface, as proved by the carbonyl index and molecular weight. Compared with the typical HALS photostabilization system containing organic hindered phenol UV absorber Tinuvin 328 (T328), the thickness of photodegradation region for PP/C944/CST was only a quarter to that for PP/C944 and PP/C944/T328, while the rates of reduction in molecular weight and increase in carbonyl index were much lower. Optical microscopic observation showed that the evolution of surface micro-cracks in PP/C944/CST was quite different from that in the other samples, while scanning electronic micrographs revealed that the depth of the micro-cracks in PP/C944/CST was much shorter than that in the others. It is therefore concluded that the protection of CST on PP thick bars is mainly attributed to the outstanding UV-shielding and cracks-blocking abilities.

Key words:

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UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

通讯作者: Ming-shu Yang,

English

UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

Corresponding author: Ming-shu Yang,

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通讯作者: 陈斌, bchen63@163.com

中国化学会秘书处

UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

通讯作者: Ming-shu Yang,

English

UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

Corresponding author: Ming-shu Yang,

CCS Chemistry：嵌段共聚物自组装成 “三明治”二维有机材料，实现纳米级压力传感功能

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