引用本文:
王森林, 宋运建. Fe-Ni-S软磁薄膜的电沉积[J]. 应用化学,
2011, 28(1): 60-65.
doi:
10.3724/SP.J.1095.2011.00150
Citation: WANG Senlin, SONG Yunjian. Electrodeposition of Fe-Ni-S Soft Magnetic Film[J]. Chinese Journal of Applied Chemistry, 2011, 28(1): 60-65. doi: 10.3724/SP.J.1095.2011.00150
Citation: WANG Senlin, SONG Yunjian. Electrodeposition of Fe-Ni-S Soft Magnetic Film[J]. Chinese Journal of Applied Chemistry, 2011, 28(1): 60-65. doi: 10.3724/SP.J.1095.2011.00150
Fe-Ni-S软磁薄膜的电沉积
摘要:
酸性镀液中以硼酸为缓冲剂、柠檬酸三钠为配合剂,在紫铜箔上电沉积得到非晶Fe-Ni-S合金薄膜。采用扫描电子显微镜和能谱分析技术(EDS)研究了镀液组成和沉积条件对镀层表面形貌和组成的影响。结果表明,在镀液中加入2g/L C7H5O3NS(糖精)和0.4g/L 1,4-丁炔二醇可获得表面平整无裂缝和较小内应力的合金镀层;电流密度和镀液pH值对镀层组成影响较小,但施镀温度对镀层组成影响较大。获得了理想的镀液组成和沉积条件,所得Fe73Ni9.5S17.5薄膜的X射线衍射表明其为非晶结构,在室温下具有较高的饱和磁化强度(Ms约为876.25kA/m)和较低的矫顽力(Hc约为4.96kA/m),具有良好的软磁性能。循环伏安曲线和阴极极化曲线均表明,镀液中CS(NH2)2会促进Fe-Ni-S共沉积。
English
Electrodeposition of Fe-Ni-S Soft Magnetic Film
Abstract:
Fe-Ni-S alloy film was prepared on red copper foil by electrodeposition from a acidic bath containing boric acid as a buffer agent and sodium citrate as a complexing agent. The effects of the bath composition, and the deposition parameters on the surface morphology and the composition of the alloy coating were studied by SEM and EDS. As a result, a smooth coating with no crack and little stress was obtained from the plating bath by adding 2 g/L saccharin and 0.4 g/L 1,4-butynediol. The cathodic current density and the plating bath pH have little effect on the coating composition, but the temperature has great effect. Fe73Ni9.5S17.5 film was prepared in optimized plating conditions, and XRD analysis showed that the coating structure is amorphous. The film has good soft magnetic performances with higher saturation magnetization (Ms≈876.25 kA/m) and lower coercivity(Hc≈4.96 kA/m) at room temperature. Cyclic voltammetry and the cathodic polarization curves indicated that thiourea can promote the co-deposition of Fe-Ni-S alloy.
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Key words:
- Fe-Ni-S
- / electro-deposition
- / amorphous alloy
- / soft magnetic performance
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