引用本文:
刘冰, 龚正烈, 姚素薇, 郭鹤桐, 袁华堂, 张允什. 半导体硅上激光诱导化学沉积镍薄膜[J]. 应用化学,
1999, 16(1): 80-82.
Citation: Liu Bing, Gong Zhenglie, Yao Suwei, Guo Hetong, Yuan Huatang, Zhang Yunshi. Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon[J]. Chinese Journal of Applied Chemistry, 1999, 16(1): 80-82.
Citation: Liu Bing, Gong Zhenglie, Yao Suwei, Guo Hetong, Yuan Huatang, Zhang Yunshi. Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon[J]. Chinese Journal of Applied Chemistry, 1999, 16(1): 80-82.
半导体硅上激光诱导化学沉积镍薄膜
English
Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon
Abstract:
Laser induced electroless deposition of nickel on the semiconductor silicon after Pd impregnation has been carried out by using YAG laser and investigated by XPS combined with Ar+ sputtering technique. The results indicated the existence of interdiffusion between Ni, Pd and Si at room temperature and formation of different silicide compounds.
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Key words:
- laser induced electroless deposition
- / nickel
- / semiconductor silicon
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