1-4丁炔二醇和乙二胺对离子液体电沉积Cu的影响

引用本文: 燕波, 张锦秋, 杨培霞, 安茂忠. 1-4丁炔二醇和乙二胺对离子液体电沉积Cu的影响[J]. 无机化学学报, 2014, 30(4): 952-960. doi: 10.11862/CJIC.2014.121 shu

Citation: YAN Bo, ZHANG Jin-Qiu, YANG Pei-Xia, AN Mao-Zhong. Effect of 2-Butyne-1,4-diol and Ethylene Diamine on Electrodeposition of Cu from Ionic Liquid[J]. Chinese Journal of Inorganic Chemistry, 2014, 30(4): 952-960. doi: 10.11862/CJIC.2014.121 shu

1-4丁炔二醇和乙二胺对离子液体电沉积Cu的影响

通讯作者: 安茂忠 mzan@hit.edu.cn

基金项目:
国家自然科学基金(No.51074057)资助项目。 (No.51074057)

摘要: 研究了1-4丁炔二醇和乙二胺作为添加剂对在离子液体1-甲基-3-甲基咪唑三氟甲磺酸盐中电沉积Cu的影响。紫外可见光吸收光谱结果表明,当采用1-4丁炔二醇作为添加剂时,1-4丁炔二醇吸附在工作电极表面且未与溶液中的Cu²⁺形成配合物。扫描电镜测试结果表明由于1-4丁炔二醇与离子液体的正离子的竞争吸附使得Cu的沉积电势发生正移并使镀层表面更加均匀平整。当采用乙二胺作为添加剂时,紫外可见光吸收光谱和循环伏安测试结果表明乙二胺与溶液中的Cu²⁺离子形成带有正电荷的络合离子使得Cu的沉积电势发生正移,扫描电镜和原子力显微镜测试结果表明得到了更加均匀的镀层。当同时加入1-4丁炔二醇和乙二胺时,Cu的沉积电势仍然发生正移并得到具有纳米粒径的镀层。

关键词:

添加剂;离子液体;电沉积;Cu镀层

English

Effect of 2-Butyne-1,4-diol and Ethylene Diamine on Electrodeposition of Cu from Ionic Liquid

1.
State Key Laboratory of Urban Water Resource and Environment, School of Chemical Engineering and Technology, Harbin Institute of Technology, Harbin 150001, China

Corresponding author: 安茂忠 mzan@hit.edu.cn

Received Date: 01 November 2013
Fund Project:
国家自然科学基金(No.51074057)资助项目。

Abstract: The effect of additives, 2-Butyne-1,4-diol (BDO) and ethylene diamine (EDA), was investigated on the electrodeposition of Cu from 1-hexyl-3-methylimidazolium trifluoromethanesulfonate ([HMIM]OTF). The results of UV-Vis absorption spectra and Cyclic voltammograms indicate that the reduction potential of Cu shifts to the positive side with the addition of BDO without any changes in the coordination environment of Cu²⁺. The adsorption of BDO on surface of working electrode results in a change in morphology of the obtained deposit. In the presence of EDA, the coordination environment of Cu²⁺ is changed, suggesting the formation of a new complex by Cu²⁺ and EDA. The deposition potential shifts to the positive side with addition of EDA. Scanning electron microscope and atomic force microscope tests show that the surface morphology of the obtained deposit is flatter and more granular compared to that without EDA. When BDO and EDA are added into [HMIM]OTF at the same time, the deposition potential still shifts positively and nano-sized grains are obtained.

Key words:

ionic liquid;2-butyne-1,4-diol;ethylene diamine;electrodepositon;Cu

1. [1] Endres F. ChemPhysChem, 2002, 3:144-154[1] Endres F. ChemPhysChem, 2002, 3:144-154
2. [2] Abbott A P, McKenzie K J. Phys. Chem. Chem. Phys., 2006, 8:4265-4279[2] Abbott A P, McKenzie K J. Phys. Chem. Chem. Phys., 2006, 8:4265-4279
3. [3] Armand M, Endres F, MacFarlane D R, et al. Nat. Mater., 2009, 8:621-629[3] Armand M, Endres F, MacFarlane D R, et al. Nat. Mater., 2009, 8:621-629
4. [4] Endres F, MacFarlane D, Abbott A P. Electrodepositon from Ionic Liquid. Weinheim: Wiley-VCH, 2008.[4] Endres F, MacFarlane D, Abbott A P. Electrodepositon from Ionic Liquid. Weinheim: Wiley-VCH, 2008.
5. [5] Hsieh Y T, Leong T I, Huang C C, et al. Chem. Commun., 2010, 46:484-486[5] Hsieh Y T, Leong T I, Huang C C, et al. Chem. Commun., 2010, 46:484-486
6. [6] Hsieh Y T, Sun I W. J. Electrochem. Commun., 2011, 13: 1510-1513[6] Hsieh Y T, Sun I W. J. Electrochem. Commun., 2011, 13: 1510-1513
7. [7] Zein El Abedin S, Giridhar P, Schwab P, et al. J. Electrochem. Commun., 2010, 12:1084-1086[7] Zein El Abedin S, Giridhar P, Schwab P, et al. J. Electrochem. Commun., 2010, 12:1084-1086
8. [8] Gasparotto L H S, Borisenko N, Bocchi N, et al. Phys. Chem. Chem. Phys., 2009, 11:11140-11145[8] Gasparotto L H S, Borisenko N, Bocchi N, et al. Phys. Chem. Chem. Phys., 2009, 11:11140-11145
9. [9] Shimamura O, Yoshimoto N, Matsumoto M, et al. J. Power Sources, 2011, 3:1586-1588[9] Shimamura O, Yoshimoto N, Matsumoto M, et al. J. Power Sources, 2011, 3:1586-1588
10. [10] Kornyshev A A. J. Phys. Chem. B, 2007, 111:5545-5557[10] Kornyshev A A. J. Phys. Chem. B, 2007, 111:5545-5557
11. [11] Fedorov M V, Kornyshev A A. J. Phys. Chem. B, 2008, 112: 11868-11872[11] Fedorov M V, Kornyshev A A. J. Phys. Chem. B, 2008, 112: 11868-11872
12. [12] Abbott A P, Barron J C, Frisch G, et al. J. Electrochimica Acta, 2011, 56:5272-5279[12] Abbott A P, Barron J C, Frisch G, et al. J. Electrochimica Acta, 2011, 56:5272-5279
13. [13] Fukui R, Katayama Y, Miura T. J. Electrochimica Acta, 2011, 56:1190-1196[13] Fukui R, Katayama Y, Miura T. J. Electrochimica Acta, 2011, 56:1190-1196
14. [14] Abbott A P, El Ttaib K, Frisch G, et al. Phys. Chem. Chem. Phys., 2009, 11:4269-4277[14] Abbott A P, El Ttaib K, Frisch G, et al. Phys. Chem. Chem. Phys., 2009, 11:4269-4277
15. [15] Cerisier M, Attenborough K, Fransaer J, et al. J. Electrochem. Soc., 1999, 146:2156-2162[15] Cerisier M, Attenborough K, Fransaer J, et al. J. Electrochem. Soc., 1999, 146:2156-2162
16. [16] Grujicic D, Pesic B. J. Electrochimica Acta, 2002, 47:2901-2912[16] Grujicic D, Pesic B. J. Electrochimica Acta, 2002, 47:2901-2912
17. [17] Donepudi V S, Venkatachalapathy R, Ozemoyah P O, et al. Solid State Lett., 2001, 4:C13-C16[17] Donepudi V S, Venkatachalapathy R, Ozemoyah P O, et al. Solid State Lett., 2001, 4:C13-C16
18. [18] LI Ya-Bing(李亚冰), WANG Wei(王为), LI Yong-Lei(李永磊). Chinese J. Inorg. Chem.(无机化学学报), 2008, 24(4): 534-540[18] LI Ya-Bing(李亚冰), WANG Wei(王为), LI Yong-Lei(李永磊). Chinese J. Inorg. Chem.(无机化学学报), 2008, 24(4): 534-540
19. [19] YANG Rui-Na(杨瑞娜), HU Xiao-Yuan(胡晓院), DUAN Zheng(段征), et al. Chinese J. Inorg. Chem.(无机化学学报), 1999, 15(6):697-708[19] YANG Rui-Na(杨瑞娜), HU Xiao-Yuan(胡晓院), DUAN Zheng(段征), et al. Chinese J. Inorg. Chem.(无机化学学报), 1999, 15(6):697-708
20. [20] Gu C D, You Y H, Wang X L, et al. Surface & Coatings Technology, 2012, 209:117-123[20] Gu C D, You Y H, Wang X L, et al. Surface & Coatings Technology, 2012, 209:117-123
21. [21] Chen P Y, Deng M J, Zhuang D X. J. Electrochimica Acta, 2009, 54:6935-6940[21] Chen P Y, Deng M J, Zhuang D X. J. Electrochimica Acta, 2009, 54:6935-6940
22. [22] Sakamoto T, Azumi K, Tachikawa H, et al. J. Electrochimica Acta, 2010, 55:8570-8578[22] Sakamoto T, Azumi K, Tachikawa H, et al. J. Electrochimica Acta, 2010, 55:8570-8578
23. [23] Katayama Y, Fukui R, Miura T. J. Electrochem. Soc., 2007, 154:D534-D537[23] Katayama Y, Fukui R, Miura T. J. Electrochem. Soc., 2007, 154:D534-D537
24. [24] Rodriguez-Torres I, Valentin G, Lapicque F. J. Appl. Electrochem., 1999, 29:1035-1044[24] Rodriguez-Torres I, Valentin G, Lapicque F. J. Appl. Electrochem., 1999, 29:1035-1044
25. [25] Zhu Y L, Kozuma Y, Katayama Y, et al. J. Electrochimica Acta, 2009, 54:7502-7506[25] Zhu Y L, Kozuma Y, Katayama Y, et al. J. Electrochimica Acta, 2009, 54:7502-7506
26. [26] Valencia H, Kohyama M, Tanaka S, et al. J. Chem. Phys., 2009, 131:244705(1)-244705(11)[26] Valencia H, Kohyama M, Tanaka S, et al. J. Chem. Phys., 2009, 131:244705(1)-244705(11)
27. [27] FANG Jing-Li(方景礼). Theory and Applications of Electro-plating Additives(电镀添加剂理论与应用). Beijing: National Defense Industry Press, 2006.[27] FANG Jing-Li(方景礼). Theory and Applications of Electro-plating Additives(电镀添加剂理论与应用). Beijing: National Defense Industry Press, 2006.

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1.
沈阳化工大学材料科学与工程学院沈阳 110142

1-4丁炔二醇和乙二胺对离子液体电沉积Cu的影响

通讯作者: 安茂忠 mzan@hit.edu.cn

English

Effect of 2-Butyne-1,4-diol and Ethylene Diamine on Electrodeposition of Cu from Ionic Liquid

Corresponding author: 安茂忠 mzan@hit.edu.cn

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通讯作者: 陈斌, bchen63@163.com

中国化学会秘书处

1-4丁炔二醇和乙二胺对离子液体电沉积Cu的影响

通讯作者: 安茂忠 mzan@hit.edu.cn

English

Effect of 2-Butyne-1,4-diol and Ethylene Diamine on Electrodeposition of Cu from Ionic Liquid

Corresponding author: 安茂忠 mzan@hit.edu.cn

CCS Chemistry：嵌段共聚物自组装成 “三明治”二维有机材料，实现纳米级压力传感功能

CCS Chemistry：颜徐州、鲍哲南： 你的皮肤可能是一片SPMs

CCS Chemistry：工作高效不疲劳，只须让催化剂动起来

CCS Chemistry：静电组装导向聚合- 聚电解质纳米凝胶量化制备新策略

CCS Chemistry：金黄色葡萄球菌醛基脱氢酶是如何识别特异性底物的？

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