铜电极表面铜锡合金电结晶机理

史纪鹏 杨防祖 田中群 周绍民

引用本文: 史纪鹏, 杨防祖, 田中群, 周绍民. 铜电极表面铜锡合金电结晶机理[J]. 物理化学学报, 2013, 29(12): 2579-2584. doi: 10.3866/PKU.WHXB201310092 shu
Citation:  SHI Ji-Peng, YANG Fang-Zu, TIAN Zhong-Qun, ZHOU Shao-Min. Electrocrystallization of Cu-Sn Alloy on Copper Electrode Surface[J]. Acta Physico-Chimica Sinica, 2013, 29(12): 2579-2584. doi: 10.3866/PKU.WHXB201310092 shu

铜电极表面铜锡合金电结晶机理

  • 基金项目:

    国家自然科学基金(21021002) (21021002)

    国家重点基础研究发展计划(973) (2009CB930703)资助项目 (973) (2009CB930703)

摘要:

在弱酸性柠檬酸盐体系铜锡合金镀液中, 采用线性扫描伏安(LSV)、循环伏安(CV)和计时安培实验方法, 运用Scharifker-Hills (SH)理论模型和Heerman-Tarallo (HT)理论模型分析拟合实验结果, 研究铜锡合金在铜电极上的电沉积过程与电结晶机理. 结果表明, 铜锡合金在铜电极表面实现共沉积并遵循扩散控制下三维瞬时成核的电结晶过程. 电位阶跃从-0.80 V负移至-0.85 V (vs SCE), HT理论分析得到铜锡合金的成核与生长的动力学参数分别为成核速率常数(A)值从20.19 s-1增加至177.67 s-1, 成核活性位点密度数(N0)从6.10×105 cm-2提高至1.42×106 cm-2, 扩散系数(D)为(6.13±0.62)×10-6 cm2·s-1.

English

    1. [1]

      (1) Hoffacker, G.; Kaiser, H.; Reissmueller, K.;Wirth, G. Cyanidic-Alkaline Baths for the Galvanic Deposition of Copper-tin AlloyCoatings, Uses Thereof, and Metallic Bases Coated with SaidCopper-tin Alloy Coating. US Patent: US 5534129, 1996-07-09.

      (1) Hoffacker, G.; Kaiser, H.; Reissmueller, K.;Wirth, G. Cyanidic-Alkaline Baths for the Galvanic Deposition of Copper-tin AlloyCoatings, Uses Thereof, and Metallic Bases Coated with SaidCopper-tin Alloy Coating. US Patent: US 5534129, 1996-07-09.

    2. [2]

      (2) Correia, A. N.; Façanha, M. X.; de Lima-Neto, P. Surf. Coat. Technol. 2007, 201 (16), 7216.(2) Correia, A. N.; Façanha, M. X.; de Lima-Neto, P. Surf. Coat. Technol. 2007, 201 (16), 7216.

    3. [3]

      (3) Hovestad, A.; Tacken, R. A. Physica Status Solidi (c) 2008, 5 (11), 3506. doi: 10.1002/pssc.v5:11(3) Hovestad, A.; Tacken, R. A. Physica Status Solidi (c) 2008, 5 (11), 3506. doi: 10.1002/pssc.v5:11

    4. [4]

      (4) Sürme, Y.; Gürten, A. A.; Bayol, E.; Ersoy, E. J. Alloy. Compd.2009, 485 (1), 98.(4) Sürme, Y.; Gürten, A. A.; Bayol, E.; Ersoy, E. J. Alloy. Compd.2009, 485 (1), 98.

    5. [5]

      (5) Finazzi, G. A.; De Oliveira, E. M.; Carlos, I. A. Surf. Coat. Technol. 2004, 187 (2), 377.(5) Finazzi, G. A.; De Oliveira, E. M.; Carlos, I. A. Surf. Coat. Technol. 2004, 187 (2), 377.

    6. [6]

      (6) Low, C. T. J.;Walsh, F. C. Surf. Coat. Technol. 2008, 202 (8),1339. doi: 10.1016/j.surfcoat.2007.06.032(6) Low, C. T. J.;Walsh, F. C. Surf. Coat. Technol. 2008, 202 (8),1339. doi: 10.1016/j.surfcoat.2007.06.032

    7. [7]

      (7) Scharifker, B.; Hills, G. Electrochim. Acta 1983, 28 (7), 879.doi: 10.1016/0013-4686(83)85163-9(7) Scharifker, B.; Hills, G. Electrochim. Acta 1983, 28 (7), 879.doi: 10.1016/0013-4686(83)85163-9

    8. [8]

      (8) Palomar-Pardavé, M.; Scharifker, B. R.; Arce, E. M.; Romero-Romo, M. Electrochim. Acta 2005, 50 (24), 4736. doi: 10.1016/j.electacta.2005.03.004(8) Palomar-Pardavé, M.; Scharifker, B. R.; Arce, E. M.; Romero-Romo, M. Electrochim. Acta 2005, 50 (24), 4736. doi: 10.1016/j.electacta.2005.03.004

    9. [9]

      (9) Ballesteros, J. C.; Chainet, E.; Ozil, P.; Meas, Y.; Trejo, G. Int. J. Electrochem. Sci. 2011, 6, 2632.(9) Ballesteros, J. C.; Chainet, E.; Ozil, P.; Meas, Y.; Trejo, G. Int. J. Electrochem. Sci. 2011, 6, 2632.

    10. [10]

      (10) Gu, M.; Zhong, Q. J. Appl. Electrochem. 2011, 41 (7), 765. doi: 10.1007/s10800-011-0293-0(10) Gu, M.; Zhong, Q. J. Appl. Electrochem. 2011, 41 (7), 765. doi: 10.1007/s10800-011-0293-0

    11. [11]

      (11) Rudnik, E.;Wojnicki, M.;Wιoch, G. Surf. Coat. Technol. 2012,207, 375. doi: 10.1016/j.surfcoat.2012.07.027(11) Rudnik, E.;Wojnicki, M.;Wιoch, G. Surf. Coat. Technol. 2012,207, 375. doi: 10.1016/j.surfcoat.2012.07.027

    12. [12]

      (12) Garfias-García, E.; Romero-Romo, M.; Ramírez-Silva, M. T.;Palomar-Pardavé, M. Int. J. Electrochem. Sci. 2012, 7, 3102.(12) Garfias-García, E.; Romero-Romo, M.; Ramírez-Silva, M. T.;Palomar-Pardavé, M. Int. J. Electrochem. Sci. 2012, 7, 3102.

    13. [13]

      (13) Scharifker, B. R.; Mostany, J. J. Electroanal. Chem. 1984, 177,13. doi: 10.1016/0022-0728(84)80207-7(13) Scharifker, B. R.; Mostany, J. J. Electroanal. Chem. 1984, 177,13. doi: 10.1016/0022-0728(84)80207-7

    14. [14]

      (14) Sluyters-Rehbach, M.;Wijenberg, J. H. O. J.; Bosco, E.;Sluyters, J. H. J. Electroanal. Chem. 1987, 236 (1), 1.(14) Sluyters-Rehbach, M.;Wijenberg, J. H. O. J.; Bosco, E.;Sluyters, J. H. J. Electroanal. Chem. 1987, 236 (1), 1.

    15. [15]

      (15) Heerman, L.; Tarallo, A. J. Electroanal. Chem. 1998, 451 (1),101.(15) Heerman, L.; Tarallo, A. J. Electroanal. Chem. 1998, 451 (1),101.

    16. [16]

      (16) Heerman, L.; Tarallo, A. J. Electroanal. Chem.1999, 470 (1),70. doi: 10.1016/S0022-0728(99)00221-1(16) Heerman, L.; Tarallo, A. J. Electroanal. Chem.1999, 470 (1),70. doi: 10.1016/S0022-0728(99)00221-1

    17. [17]

      (17) Yue, J. P.; Yang, F. Z.; Tian, Z. Q.; Zhou, S. M. Acta Phys. -Chim.Sin. 2011, 27 (6), 1446. [岳俊培, 杨防祖, 田中群, 周绍民. 物理化学学报, 2011, 27 (6), 1446.] doi: 10.3866/PKU.WHXB20110620(17) Yue, J. P.; Yang, F. Z.; Tian, Z. Q.; Zhou, S. M. Acta Phys. -Chim.Sin. 2011, 27 (6), 1446. [岳俊培, 杨防祖, 田中群, 周绍民. 物理化学学报, 2011, 27 (6), 1446.] doi: 10.3866/PKU.WHXB20110620

    18. [18]

      (18) Zhou, L.; Dai, Y.; Zhang, H.; Jia, Y.; Zhang, J.; Li, C. Bull. Korean Chem. Soc. 2012, 33 (5), 1541. doi: 10.5012/bkcs.2012.33.5.1541(18) Zhou, L.; Dai, Y.; Zhang, H.; Jia, Y.; Zhang, J.; Li, C. Bull. Korean Chem. Soc. 2012, 33 (5), 1541. doi: 10.5012/bkcs.2012.33.5.1541

    19. [19]

      (19) Lomax, D. J.; Kinloch, I. A.; Dryfe, R. A.W. AuElectrodeposition on Carbon Materials. In Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference onNanotechnology, Birmingham, United Kingdom, Aug 20-23,2012; IEEE; 2012; pp 1-4.(19) Lomax, D. J.; Kinloch, I. A.; Dryfe, R. A.W. AuElectrodeposition on Carbon Materials. In Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference onNanotechnology, Birmingham, United Kingdom, Aug 20-23,2012; IEEE; 2012; pp 1-4.

    20. [20]

      (20) Granados-Ner, M.; Huizar, L. H. M.; Rios-Reyes, C. H.Química Nova 2011, 34 (3), 439.(20) Granados-Ner, M.; Huizar, L. H. M.; Rios-Reyes, C. H.Química Nova 2011, 34 (3), 439.

    21. [21]

      (21) Emekli, U.;West, A. C. Electrochim. Acta 2009, 54 (4),1177. doi: 10.1016/j.electacta.2008.08.065(21) Emekli, U.;West, A. C. Electrochim. Acta 2009, 54 (4),1177. doi: 10.1016/j.electacta.2008.08.065

    22. [22]

      (22) Zhang, Q. B.; Hua, Y. X. J. Appl. Electrochem. 2011, 41 (6),705. doi: 10.1007/s10800-011-0283-2(22) Zhang, Q. B.; Hua, Y. X. J. Appl. Electrochem. 2011, 41 (6),705. doi: 10.1007/s10800-011-0283-2

    23. [23]

      (23) Pewnim, N.; Roy, S. Electrochim. Acta 2013, 90, 498. doi: 10.1016/j.electacta.2012.12.053(23) Pewnim, N.; Roy, S. Electrochim. Acta 2013, 90, 498. doi: 10.1016/j.electacta.2012.12.053

    24. [24]

      (24) Fletcher, S. Electrochim. Acta 1983, 28 (7), 917. doi: 10.1016/0013-4686(83)85167-6(24) Fletcher, S. Electrochim. Acta 1983, 28 (7), 917. doi: 10.1016/0013-4686(83)85167-6

    25. [25]

      (25) Bard, A. J.; Faulkner, L. R. Electrochemical Methods: Fundamental and Applications, 2nd ed.; JohnWiley: New York,2001; pp 234-236.(25) Bard, A. J.; Faulkner, L. R. Electrochemical Methods: Fundamental and Applications, 2nd ed.; JohnWiley: New York,2001; pp 234-236.

    26. [26]

      (26) Ying, R. Y. J. Electrochem. Soc. 1988, 135 (12), 2957. doi: 10.1149/1.2095469(26) Ying, R. Y. J. Electrochem. Soc. 1988, 135 (12), 2957. doi: 10.1149/1.2095469

    27. [27]

      (27) Barry, F. J.; Cunnane, V. J. J. Electroanal. Chem. 2002, 537 (1),151.(27) Barry, F. J.; Cunnane, V. J. J. Electroanal. Chem. 2002, 537 (1),151.

    28. [28]

      (28) Hu,W.; Tan, C. Y.; Cui, H.; Zheng, Z. Q. The Chinese Journal of Nonferrous Metals 2010, 20 (5), 1006. [胡炜, 谭澄宇,崔航, 郑子樵. 中国有色金属学报, 2010, 20 (5), 1006.](28) Hu,W.; Tan, C. Y.; Cui, H.; Zheng, Z. Q. The Chinese Journal of Nonferrous Metals 2010, 20 (5), 1006. [胡炜, 谭澄宇,崔航, 郑子樵. 中国有色金属学报, 2010, 20 (5), 1006.]

    29. [29]

      (29) Michailova, E.; Milchev, A. J. Appl. Electrochem. 1991, 21 (2),170. doi: 10.1007/BF01464299

      (29) Michailova, E.; Milchev, A. J. Appl. Electrochem. 1991, 21 (2),170. doi: 10.1007/BF01464299

  • 加载中
计量
  • PDF下载量:  746
  • 文章访问数:  1198
  • HTML全文浏览量:  53
文章相关
  • 发布日期:  2013-11-28
  • 收稿日期:  2013-07-30
  • 网络出版日期:  2013-10-09
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

/

返回文章