衬底温度对ZnO薄膜生长过程和微结构的影响

引用本文: 刘永利, 刘欢, 李蔚, 赵骞, 祁阳. 衬底温度对ZnO薄膜生长过程和微结构的影响[J]. 物理化学学报, 2013, 29(03): 631-638. doi: 10.3866/PKU.WHXB201212122 shu

Citation: LIU Yong-Li, LIU Huan, LI Wei, ZHAO Qian, QI Yang. Effect of Substrate Temperature on the Growth and Microstructure of ZnO Film[J]. Acta Physico-Chimica Sinica, 2013, 29(03): 631-638. doi: 10.3866/PKU.WHXB201212122 shu

衬底温度对ZnO薄膜生长过程和微结构的影响

刘永利 ^1, ,
刘欢 ^1, ,
李蔚 ^1, ,
赵骞 ^2, ,
祁阳 ^1,

基金项目:
教育部中央高校基本科研业务费(N100305001, N110205001, N110105001) (N100305001, N110205001, N110105001)

国家自然科学基金(51172040)资助项目 (51172040)

摘要:

从原子尺度上去研究薄膜生长过程中温度对薄膜取向性、缺陷结构以及薄膜完整性的影响和作用规律, 对于解释薄膜生长的物理本质、控制生长条件、提高薄膜制备的质量具有重要意义. 本文应用基于反应力场的分子动力学方法研究了ZnO薄膜(000l)表面作为衬底的薄膜沉积生长过程, 初步讨论了衬底温度(200、500和800 K)变化对沉积较薄ZnO膜质量的影响, 部分结果与实验观察相符. 结果表明, 衬底温度在500 K左右时, 沉积原子结构径向分布函数曲线特征峰尖锐、明显, 有序度较高, 注入和溅射对薄膜完整性影响较小, 沉积形成的薄膜结构稳定而又致密. 在预置衬底表面平坦的情况下薄膜呈现一种链岛状的生长模式, 每原子层均具有两种生长取向, 导致其生长前锋交汇处形成了一种新的有序缺陷.

关键词:

English

Effect of Substrate Temperature on the Growth and Microstructure of ZnO Film

LIU Yong-Li ^1, ,
LIU Huan ^1, ,
LI Wei ^1, ,
ZHAO Qian ^2, ,
QI Yang ^1,

1.
1 Institute of Material Physics and Chemistry, College of Science, Northeastern University, Shenyang 110819, P. R. China;
2 Physics Experiment Center, College of Science, Shenyang University of Technology, Shenyang 110031, P. R. China
Received Date: 12 September 2012
Available Online: 25 February 2013
Fund Project:
教育部中央高校基本科研业务费(N100305001, N110205001, N110105001)

国家自然科学基金(51172040)资助项目

Abstract:

Understanding the effect of temperature on the orientation, microstructure, integrity, and growth mechanism of ZnO films on the atomic scale is needed to clarify the process of film growth, control deposition conditions, and improve film quality. Using the reaction force field method of molecular dynamics, we theoretically studied the effect of substrate temperature (200, 500, and 800 K) on the quality of ZnO films. Some of our results agree with experimental observations. We found that the radial distribution function curves of the deposited structures were sharp and highly ordered. The thin film formed at 500 K possessed the most stable and ordered structure of those investigated. The film grew with an island mechanism, and two orientations were present on every deposited atomic plane, which led to the formation of a special fault structure at interfacial regions.

Key words:

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沈阳化工大学材料科学与工程学院沈阳 110142

衬底温度对ZnO薄膜生长过程和微结构的影响

English

Effect of Substrate Temperature on the Growth and Microstructure of ZnO Film

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通讯作者: 陈斌, bchen63@163.com

中国化学会秘书处

衬底温度对ZnO薄膜生长过程和微结构的影响

English

Effect of Substrate Temperature on the Growth and Microstructure of ZnO Film

CCS Chemistry：嵌段共聚物自组装成 “三明治”二维有机材料，实现纳米级压力传感功能

CCS Chemistry：颜徐州、鲍哲南： 你的皮肤可能是一片SPMs

CCS Chemistry：工作高效不疲劳，只须让催化剂动起来

CCS Chemistry：静电组装导向聚合- 聚电解质纳米凝胶量化制备新策略

CCS Chemistry：金黄色葡萄球菌醛基脱氢酶是如何识别特异性底物的？

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