总气压与Ar/O<sub>2</sub>流量比对直流对向靶磁控溅射TiO<sub>2</sub>薄膜光催化性能的影响

引用本文: 陈芃, 谭欣, 于涛. 总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响[J]. 物理化学学报, doi: 10.3866/PKU.WHXB201207061 shu

Citation: CHEN Peng, TAN Xin, YU Tao. Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering[J]. Acta Physico-Chimica Sinica, doi: 10.3866/PKU.WHXB201207061 shu

总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响

陈芃 ^1,2, ,
谭欣 ^1, ,
于涛 ^3,

基金项目:
国家重点基础研究发展规划项目(973) (2012CB720100) (973) (2012CB720100)

国家自然科学基金(20973124)资助 (20973124)

摘要:

采用对向靶磁控溅射法在不同气压和Ar/O₂流量比条件下, 以氟化SnO₂ (FTO)导电玻璃为基底制备了多晶TiO₂薄膜. 台阶仪测量结果显示所制备TiO₂薄膜的平均厚度约为200 nm. 随着溅射气压的升高, TiO₂薄膜由锐钛矿与金红石混晶结构转变为纯锐钛矿结构. 分别采用场发射扫描电镜(FESEM)和原子力显微镜(AFM)分析了不同气压和Ar/O₂流量比对TiO₂薄膜表面形貌的影响, 结果显示TiO₂薄膜的表面粗糙度随溅射总气压和Ar/O₂流量比的增加而增大. 以初始浓度为100×10^-6 (体积分数)的异丙醇(IPA)气体为目标物检测所制备TiO₂薄膜的光催化性能, 并分析该气相光催化反应的机理, 在紫外照射条件下异丙醇先氧化为丙酮再被氧化为CO₂.当总溅射气压为2.0 Pa、Ar/O₂流量比为1:1时, 溅射所得TiO₂薄膜具备最优光催化活性并可在IPA降解反应中保持较高的催化活性和稳定性.

关键词:

English

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

1.
1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, P. R. China;
2. Institute of Seawater Desalination and Multipurpose Utilization, State Oceanic Administration, Tianjin 300192, P. R. China;
3. School of Chemical Engineering, Tianjin University, Tianjin 300072, P. R. China
Received Date: 30 March 2012
Available Online: 02 August 2012
Fund Project:
国家重点基础研究发展规划项目(973) (2012CB720100)

国家自然科学基金(20973124)资助

Abstract:

Polycrystalline TiO₂ thin films were prepared by direct current facing-target magnetron sputtering at different sputtering pressures and Ar/O₂ flow ratios. The average thickness of all prepared films was 200 nm, measured by surface roughness tester. With increase in sputtering pressure (p_tot), the prepared films changed from mixtures of anatase and rutile phases to pure anatase. The influences of different sputtering pressures and Ar/O₂ flow ratios on surface morphology of prepared films were investigated by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). The film surface was found to become rougher with increasing pressure and Ar/O₂ flow ratios. Photocatalytic activities of the prepared TiO₂ thin films were investigated by decomposition of iso-propanol (IPA) with initial concentration of 100×10^-6 (volume fraction) under UV irradiation. The IPA was oxidized to acetone and further to carbon dioxide. TiO₂ thin film deposited at 2.0 Pa with an Ar/O₂ flow ratio of 1:1 showed the highest photocatalytic activity and maintained a high stability constant during the reaction.

Key words:

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1.
沈阳化工大学材料科学与工程学院沈阳 110142

总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响

English

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

CCS Chemistry：嵌段共聚物自组装成 “三明治”二维有机材料，实现纳米级压力传感功能

CCS Chemistry：颜徐州、鲍哲南：你的皮肤可能是一片SPMs

CCS Chemistry：工作高效不疲劳，只须让催化剂动起来

CCS Chemistry：静电组装导向聚合- 聚电解质纳米凝胶量化制备新策略

CCS Chemistry：金黄色葡萄球菌醛基脱氢酶是如何识别特异性底物的？

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通讯作者: 陈斌, bchen63@163.com

中国化学会秘书处

总气压与Ar/O2流量比对直流对向靶磁控溅射TiO2薄膜光催化性能的影响

English

Effects of Total Pressure and Ar/O2 Flow Ratios on Photocatalytic Properties of TiO2 Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

CCS Chemistry：嵌段共聚物自组装成 “三明治”二维有机材料，实现纳米级压力传感功能

CCS Chemistry：颜徐州、鲍哲南： 你的皮肤可能是一片SPMs

CCS Chemistry：工作高效不疲劳，只须让催化剂动起来

CCS Chemistry：静电组装导向聚合- 聚电解质纳米凝胶量化制备新策略

CCS Chemistry：金黄色葡萄球菌醛基脱氢酶是如何识别特异性底物的？

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通讯作者: 陈斌, bchen63@163.com

中国化学会秘书处

总气压与Ar/O₂流量比对直流对向靶磁控溅射TiO₂薄膜光催化性能的影响

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

CCS Chemistry：颜徐州、鲍哲南：你的皮肤可能是一片SPMs