Citation: JIANG Lei, HUANG Hui, WANG Chun-Tao, ZHANG Wen-Kui, GAN Yong-Ping, TAO Xin-Yong. Photoelectrochromic Properties of TiO2-xNx/NiO Bilayer Thin Films[J]. Acta Physico-Chimica Sinica, 2010, 26(02): 299-303. doi: 10.3866/PKU.WHXB20100226
氮掺杂二氧化钛-氧化镍双层薄膜的光电致色特性
以金属钛为靶材、O2/N2/Ar混合气氛为溅射气体, 在导电玻璃(ITO)表面磁控溅射一层薄膜, 再经300-500 ℃退火处理制备了氮掺杂TiO2薄膜. 采用X射线衍射(XRD)、X光电子能谱(XPS)、扫描电子显微镜(SEM)和紫外-可见吸收光谱等对薄膜的微观结构、光学特性和光电化学性能等进行了研究. 进而采用化学沉积的方法在TiO2-xNx薄膜表面沉积上一层多孔NiO薄膜, 研究表明, 制备的ITO/TiO2-xNx/NiO双层薄膜具有明显的光电致色特性, 400 ℃退火处理的氮掺杂TiO2薄膜具有最高的光电流响应, 经氙灯照射1 h后, 薄膜从无色变成棕色, 500 nm波长处光透过率从79.0%下降至12.6%.
English
Photoelectrochromic Properties of TiO2-xNx/NiO Bilayer Thin Films
N-doped TiO2 films were prepared on indium tin oxide(ITO) conducting glass by dc-reactive magnetron sputtering using a Ti target in an O2/N2/Ar mixture gas in combination with heat-treatment at 300-500 ℃. The microstructure, optical and photoelectrochemical properties of the as-formed filmswere characterized byX-ray diffraction (XRD), X-ray photoelectron spectroscopy(XPS), scanning electron microscopy(SEM) and UV-Vis transmittance spectrum. Highly porous NiO was deposited onto the N-doped TiO2 layer by chemical bath deposition to obtain ITO/TiO2-xNx/NiO bilayer thin films and they exhibited excellent and noticeable photoelectrochromism. The TiO2-xNx film annealed at 400 ℃ showed the highest photocurrent response. The color of films changed from colorless to brown and the transmittance varied from 79.0% to 12.6% at 500 nmafter 1 h of irradiation.
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Key words:
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Photoelectrochromism
- / N-doped TiO2
- / NiO
- / Photoelectrochemical property
- / Thin film
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