引用本文:
王晓峰, 陈义旺. 含氟聚酰亚胺接枝低聚倍半硅氧烷制备超低介电材料[J]. 应用化学,
2006, 23(5): 484-488.
Citation: WANG Xiao-Feng, CHEN Yi-Wang. Ultra-low-ε Nanocomposites of Novel Fluorinated Polyimides Grafted with Polyhedral Oligomeric Silsesquioxane[J]. Chinese Journal of Applied Chemistry, 2006, 23(5): 484-488.
Citation: WANG Xiao-Feng, CHEN Yi-Wang. Ultra-low-ε Nanocomposites of Novel Fluorinated Polyimides Grafted with Polyhedral Oligomeric Silsesquioxane[J]. Chinese Journal of Applied Chemistry, 2006, 23(5): 484-488.
含氟聚酰亚胺接枝低聚倍半硅氧烷制备超低介电材料
摘要:
通过热引发甲基丙烯酸环戊基-立方低聚倍半硅氧烷(R7R'Si8O12或POSS)(MA-POSS)与臭氧预处理的含氟聚酰亚胺(6F-Durene)自由基接枝共聚制得6F-Durene共价接枝包含立方低聚倍半硅氧烷(POSS)的聚甲基丙烯酸酯(PMA)支链的纳米复合物。用核磁共振(NMR)、X射线衍射(XRD)和场发射扫描电子显微镜(FESEM)等测试技术分别对POSS/6F-Durene纳米复合物进行了结构表征及形貌观察。POSS/6F-Durene纳米复合物薄膜与未接枝的6F-Durene薄膜相比具有更低的介电常数ε(在2.5~2.0范围内)。
English
Ultra-low-ε Nanocomposites of Novel Fluorinated Polyimides Grafted with Polyhedral Oligomeric Silsesquioxane
Abstract:
Nanocomposites of 6F-Durene with covalently grafted polymethacrylate(PMA) side chains containing polyhedral oligomeric silsesquioxane(R7R'Si8O12 or POSS) units were prepared by means of the thermally-initiated free-radical graft polymerization of methacrylcyclopentyl-POSS(MA-POSS) with ozone-pretreated 6F-Durene.The chemical composition and the structure of the 6F-Durene with grafted methacrylcyclopentyl-POSS side chains(POSS/6F-Durene copolymers) were characterized by nuclear magnetic resonance(NMR),X-ray diffraction(XRD) and field-emission scanning electron microscopy(FESEM).The POSS/6FDurene nanocomposite films had both lower and tunable dielectric constants(ε's) in comparison with the pristine 6F-Durene films,with values between 2.0 and 2.5.
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